Product Overview
Concentrate Liquid Photoresist Developer D40 (120 mL) is a high-performance solution tailored for precision PCB photo fabrication. Designed for compatibility with negative-acting photoresist dry films and liquid inks, this developer ensures rapid, reliable results for intricate circuit board manufacturing and microelectronics applications.
Key Features
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Compatibility: Optimized for negative-acting photoresist dry films and liquid inks.
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Fast Development: Achieves full development in under 1 minute, accelerating production cycles.
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Extended Shelf Life: Indefinite storage stability when kept in a cool, dark environment.
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Cost-Efficient: A single 120 mL bottle yields up to 5.4 liters of working solution (diluted 1:18 with deionized water).
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Reusable Working Solution: Maximizes value by retaining effectiveness through multiple uses.
Yield & Dilution
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Working Solution Yield: 120 mL concentrate → 5.4 liters of developer.
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Coverage: Develops approximately 1.5 m² of 40-micron-thick photoresist dry film.
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Dilution Formula:
Volume of D40 (mL) = 18 × Sump Size (L)
Example: 18 mL D40 per 1 L deionized water.
Benefits
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Rapid Processing: Reduces downtime with sub-1-minute development.
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Economical: High dilution ratio lowers cost per application.
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Versatile: Suitable for immersion, spray, or manual application methods.
Usage Instructions
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Dilution: Mix 18 mL D40 with 1 L deionized water.
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Surface Prep: Clean photoresist-coated substrate thoroughly.
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Application: Immerse, spray, or spread solution evenly.
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Develop: Process for <1 minute; monitor progress.
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Rinse & Dry: Flush with deionized water and air-dry.
Safety & Storage
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PPE Required: Gloves, goggles, and lab coat.
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Ventilation: Use in well-ventilated areas.
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Storage: Keep in a cool, dark place away from heat.
Applications
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Printed Circuit Board (PCB) fabrication
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Semiconductor manufacturing
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MEMS and microelectronics R&D
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Laboratory photoresist processing
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