Concentrate Liquid Photoresist Developer D40 (120ml)

Concentrate Liquid Photoresist Developer D40 (120 mL)

Product Overview:
Concentrate Liquid Photoresist Developer D40 in a 120 mL bottle is specially formulated for the PCB photo fabrication process. This high-performance developer is ideal for working with negative acting photoresist dry films and liquid inks, ensuring optimal results for precision circuit board applications.

Key Features:

• Compatibility: Specifically designed for negative acting photoresist dry films and liquid inks, making it versatile across various projects.
• Optimal Development Time: Capable of developing photoresist in less than 1 minute, streamlining your workflow.
• Long Life & Indefinite Shelf Life: This concentrated solution offers a long usable life and can be stored indefinitely without degradation.
• Bottle Volume: Available in a 120 mL bottle, providing a larger volume for extended use.

Yield Information:
This 120 mL bottle of D40 Concentrate Developer will make up to 5.4 liters of working developer solution, which can develop approximately 1.5 m² of 40-micron-thick photoresist dry film.

Working Solution Makeup Formula:
To prepare the working solution:

• Formula: Volume of D40 (mL) = 18 X Sump Size (liters)
• Preparation Example: Use 0.018 liters (18 mL) of D40 per liter of deionized water for dilution.

Benefits:

• Efficient Development: Quick development time of less than 1 minute allows for a rapid processing cycle, ensuring high productivity.
• Cost-Effective: The concentrated formulation allows you to prepare large volumes of developer from a single 120 mL bottle, making it economical for larger projects.
• Reusability: The working solution can be reused multiple times until it becomes ineffective, reducing waste and cost.

Usage Instructions:

1. Preparation: Dilute the concentrated developer according to the formula provided, ensuring accurate measurements for optimal performance.
2. Surface Preparation: Ensure that the substrate, coated with the photoresist, is clean and free from contaminants.
3. Application: Apply the diluted developer solution to the substrate by immersing, spraying, or spreading evenly.
4. Development Time: Allow the photoresist to develop for less than 1 minute, monitoring for complete removal of unwanted areas.
5. Rinsing: Once development is complete, rinse the substrate thoroughly with deionized water to eliminate residual developer and unexposed photoresist.
6. Drying: Allow the substrate to air-dry or use a clean, lint-free cloth to gently dry.

Safety Precautions:

• Personal Protective Equipment (PPE): Always wear appropriate gloves, chemical goggles, and lab coats when handling the developer.
• Ventilation: Work in a well-ventilated area to minimize inhalation risk from vapors.
• Storage: Store in a cool, dark place away from heat sources and incompatible materials.

Common Applications:

• Printed Circuit Board (PCB) Fabrication
• Semiconductor Manufacturing
• Microelectronics and MEMS Development
• Laboratory Photoresist Development Procedures

Concentrate Liquid Photoresist Developer D40 (120 mL) offers a reliable and efficient solution for the PCB photo fabrication process, delivering exceptional results for intricate circuit board applications while providing flexibility and cost-effectiveness for larger-scale operations.