Concentrate Liquid Photoresist Developer D40 (50ml)

Concentrate Liquid Photoresist Developer D40 (50 mL)

Product Overview:
Concentrate Liquid Photoresist Developer D40 is a specially formulated developer designed for the PCB photo fabrication process. This high-performance developer is ideal for use with negative acting photoresist dry films and liquid inks, ensuring optimal results for the finest circuit board applications.

Key Features:

• Compatibility: Specifically designed for negative acting photoresist dry films and liquid inks, making it versatile for various applications.
• Optimal Development Time: Achieves full development in less than 1 minute, allowing for efficient workflow management.
• Long Life & Indefinite Shelf Life: This formulation is engineered to offer a long usable life and can be stored indefinitely without degrading.
• Bottle Volume: Available in a convenient 50 mL bottle, making it easy to handle and store.

Yield Information:
This 50 mL bottle of D40 Concentrate Developer will make up to 2.7 liters of working developer solution, which is capable of developing approximately 0.75 m² of 40-micron-thick photoresist dry film.

Working Solution Makeup Formula:
To prepare the working solution:

• Formula: Volume of D40 (mL) = 18 X Sump Size (liters)
• Preparation Example: Use 0.018 liters (18 mL) of D40 per liter of deionized water for dilution.

Benefits:

• Efficient Development: Quick development time of less than 1 minute allows for a rapid processing cycle, ensuring high productivity.
• Cost-Effective: The concentrated formulation enables the preparation of large volumes of developer from a single 50 mL bottle, reducing overall costs.
• Reusability: The working solution can be reused multiple times until it becomes ineffective, making it economical and practical for extensive projects.

Usage Instructions:

1. Preparation: Dilute the concentrated developer according to the formula provided, ensuring accurate measurements for optimal performance.
2. Surface Preparation: Ensure that the substrate coated with photoresist is clean and free from contaminants.
3. Application: Apply the diluted developer solution to the substrate by immersing, spraying, or spreading evenly.
4. Development Time: Allow the photoresist to develop for less than 1 minute, monitoring for complete removal of unwanted areas.
5. Rinsing: Once development is complete, rinse the substrate thoroughly with deionized water to eliminate any residual developer and unexposed photoresist.
6. Drying: Allow the substrate to air-dry or use a clean, lint-free cloth to gently dry.

Safety Precautions:

• Personal Protective Equipment (PPE): Wear appropriate gloves, safety goggles, and lab coats when handling the developer.
• Ventilation: Work in a well-ventilated area to minimize inhalation risk.
• Storage: Store in a cool, dark location away from heat sources and incompatible materials.

Common Applications:

• Printed Circuit Board (PCB) Fabrication
• Semiconductor Manufacturing
• Microelectronics and MEMS Development
• Laboratory Photoresist Development Procedures

Concentrate Liquid Photoresist Developer D40 provides a reliable and efficient solution for the PCB photo fabrication process, delivering precision and high-quality results for intricate circuit board applications.