Product Overview:

Photoresist Developer PR-3 is a premium powdered formulation designed for the PCB photo fabrication process. Each convenient sachet prepares 1 liter of working solution, ideal for extended projects or repeated use. PR-3 efficiently develops negative-acting photoresist materials, delivering high-resolution results for precision circuit patterns.

Key Features:

• Optimized for PCB Photo Fabrication: Engineered to meet rigorous industry standards, suitable for both professional and hobbyist applications.

• Broad Compatibility: Works with negative-acting photoresists, including dry films and liquid inks, ensuring versatility across workflows.

• High-Resolution Performance: Enables development of ultra-fine circuit features with exceptional accuracy.

• Enhanced Formula: Faster development cycles and improved consistency for reliable outcomes.

• Rapid Processing: Achieves full development in under 1 minute (at recommended temperatures), boosting productivity.

Yield Information:
One sachet produces 1 liter of developer solution, sufficient to develop up to 100 x 30 cm of 40 μm thick photoresist-coated substrates.

How to Use:

1. Preparation:

   1. Dissolve the entire sachet in 1 liter of deionized water (room temperature, 20–25°C).

   2. Stir continuously until fully dissolved.

2. Surface Preparation:

   • Ensure substrates are clean, dry, and free of contaminants before development.

3. Application:

   • Apply via immersion, spray, or brush. Agitate gently for uniform coverage.

4. Development Time:

   • Monitor closely; typical process completes in 30–60 seconds. Adjust time based on temperature and resist type.

5. Rinsing:

   • Immediately rinse with deionized water to halt development and remove residues.

6. Drying:

   • Air-dry or pat gently with a lint-free cloth.

Safety Precautions:

• PPE Required: Wear nitrile gloves, safety goggles, and a lab coat during handling.

• Ventilation: Use in a well-ventilated area to minimize exposure to powder particles.

• Storage: Keep unopened sachets in a cool, dry place (15–25°C), away from sunlight and moisture.

Common Applications:

• PCB prototyping and manufacturing

• Microelectronics and MEMS fabrication

• Photoresist-based laboratory processes

Why Choose PR-3?

Photoresist Developer PR-3 combines precision, speed, and ease of use, making it a top choice for high-resolution circuit board development. Its enhanced formula ensures consistent performance for professionals and hobbyists alike, streamlining workflows without compromising quality.